Natural Products for Cosmetic Ingredients
NATURALNISK D (50%aqua)
(INCI Code:TEA Dextrin Octenylsuccinate)
Addition:0.2% methyl parahydroxybenzoate and
0.3% sodium sulfate, anhydrous
・Less irritant and skin friendly sugar based
surfactants.
・Smooth touch and wet feeling of hairs with a small
amount of NATURALNISK D.
・Available antiseptic and sulfurous acid soda
additive-free (NATURALNISK DP).
Application:Shampoo, Conditioner, Facial soap etc. |
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NATURALNISK NR
(INCI Code:Sodium Dextrin Octenylsuccinate)
・Similarly to TEA salt , less irritant but
better foaming property. Comparing to
Alkyl-glycosides, much better
foam-breaking is one of main
characteristics. |
OCTIE (INCI Code:Aluminium Starch Octenylsuccinate)
・Fine powder in 5〜20μm. (corn starch origin)
・Exhibit water repellency due to its hydrophobic group.
・Evenly dispersing into ethanol, liquid paraffin, propylene glycol etc.
・Also evenly dispersing in water by adding surfactant.
・Particles are swelling and gelatinizing by heating more than 60℃ in water.
・By adding OCTIE to oily materials, it restrains sticky touch and gives
dry feeling.
・No whitish mark remains on skin.
Application:Foundation, Cream, Ointment, Milky lotion, Face lotion,
Face powder,
Talcum powder etc. |
Basic prescription
OCTIE 0〜50
Petrolatum 40
Liquid paraffin 10 |
|
Added volume
|
0%
|
10%
|
20%
|
30%
|
40%
|
50%
|
|
sticky in some extent
|
23
|
14
|
7
|
4
|
4
|
0
|
|
sticky a little
|
8
|
16
|
17
|
15
|
15
|
6
|
|
hardly sticky
|
1
|
2
|
7
|
10
|
9
|
15
|
|
dry and smooth
|
0
|
0
|
1
|
3
|
4
|
11
|
|
| Test result by 17 of women and 15 of men. |
EXCELL NL (60% aqua)
(INCI Code:Hydrogenated Starch Hydrolysate
Hydroxypropyltrimonium Chloride)
・This is cationic hydrogenated starch syrup
derivative containing a high level of
substituent groups as well as cationic
quaternary ammonium groups.
・High moisture retention due to its low
molecular weight and the amount of nitrogen
which is between 2.7% to 3.2% by weight.
・Reasonable wet feeling of hairs.
Application:Admixture for Shampoo,
Conditioner etc.
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